RSS-Feed abonnieren
Bitte kopieren Sie die angezeigte URL und fügen sie dann in Ihren RSS-Reader ein.
https://www.thieme-connect.de/rss/thieme/de/10.1055-s-00000083.xml
Synlett 1992; 1992(4): 360-362
DOI: 10.1055/s-1992-22015
DOI: 10.1055/s-1992-22015
letter
© Georg Thieme Verlag, Rüdigerstr. 14, 70469 Stuttgart, Germany. All rights reserved.
This journal, including all individual contributions and illustrations published
therein, is legally protected by copyright for the duration of the copyright period.
Any use, exploitation or commercialization outside the narrow limits set by copyright
legislation, without the publisher's consent, is illegal and liable to criminal prosecution.
This applies in particular to photostat reproduction, copying, cyclostyling, mimeographing
or duplication of any kind, translating, preparation of microfilms, and electronic
data processing and storage.Fluorine and Trifluoromethyl Substituted Anilines: Site Selective Metalation and Electrophilic Substitution
Weitere Informationen
Publikationsverlauf
Publikationsdatum:
08. März 2002 (online)
als PDF herunterladen(opens in new window) Lizenzen und Reprints(opens in new window) Alle Artikel dieser Rubrik(opens in new window)

When treated with tert-butyllithium in tetrahydrofuran at -50 °C, N-BOC (tert-butoxycarbonyt) protected fluoroanilines and trifluoromethylanilines undergo metalation at the nitrogenadjacent position. If, however, the nitrogen carries two alkyl or trimethylsilyl groups as substituents and highly polar metalating reagents such as butyllithium activated by N,N,N′N″,N″-pentamethyldiethylenetriamine (PMDTA) or potassium tert-butoxide are employed, the fluoroaniline derivatives are preferentially deprotonated next to the halogen atom.